"this implementation will enable designers to optimally implement ARM Mali-T600 family GPUs using Synopsys tools in sub 20-nm leading-edge process technologies."
"ARM said this combined functionality brings additional hardware complexity which is further compounded by the new double-patterning requirements introduced by 20-nm and below technologies."
The "leading-edge" process technology is a misnomer, as evidenced by the second statement. Though nominally on par with Intel, this is actually still a generation or so behind. IIRC, Intel doesn't need to use double-patterning for their interconnects, because they are already implement EUV lithography.
And the problem gets worse in the next-generation as ARM manufacturers will still be using 20nm double-patterned interconnects when their transistors hit 14nm. So power draw will drop, but density will still remain at 20nm even though they'll be marketed at 14nm due to transistor size.
Basically this story is a lot of fluff, trying to spin how their weaker, older process technology is somehow something to be proud of.