News ASML sets density record with latest chipmaking tools — High-NA EUV equipment prints first patterns

[Admin]

ASML has reached another milestone with its Twinscan EXE:5000 lithography system.

ASML sets density record with latest chipmaking tools — High-NA EUV equipment prints first patterns : Read more

 

[elforeign]

Will the cost for the High NA tools remain the same over their lifetime or will they come down in price? Can't imagine very many of these going out to customers given the capital required and the inability for the Chinese to buy these.

Aside from Intel, TSMC and R&D at IMEC and ASML, how many others would realistically be looking at using these? Samsung, any of the other DRAM makers or Japanese/European fabs?

 

[JarredWaltonGPU]

Will the cost for the High NA tools remain the same over their lifetime or will they come down in price? Can't imagine very many of these going out to customers given the capital required and the inability for the Chinese to buy these.

Aside from Intel, TSMC and R&D at IMEC and ASML, how many others would realistically be looking at using these? Samsung, any of the other DRAM makers or Japanese/European fabs?

Like any technology, early adopters will pay a lot more — to cover the R&D behind the tech, among other things. I don't know how much prices will drop over the lifetime of the Twinscan EX:5000 as an example, but presumably at some point in 5~10 years they'll be more readily available for what will then be trailing edge nodes.