Fixed that for you, as you misquoted the article. 3.4% CE is "globally advanced" level of efficiency already, the article and original
research paper clearly states this.
"Pulse frequency" rate is not reported in this article nor in the
original research paper. Maybe ask your AI tool to stop hallucinating BS and making things up.
Again, that is huge misquote. The article doesn’t say the laser is
limited to inspection. It states:
The article says the system is suitable for EUV exposure validation and mask inspection, exposure validation means simulating actual lithography, not just inspection.
It’s a lab-scale platform, but already globally advanced, with 3% CE and plans to reach 6%. The necessary kilowatt-class lasers are commercially available, so this is a real step toward full lithography use.......not something inherently limited.
Dr. Lin Nan is the Former
Head of Light Source Technology at ASML in Netherlands.
Dr. Lin Nan now works for the Chinese Academy of Sciences, which is basically the Chinese government.
Continue man, it's just so fun. Say it one more time, "China will never...."