IBM researchers claim to have found a way to use deep-ultraviolet (DUV) lithography techniques for the production of 32 nm chips and smaller. The limits of DUV have been pushed out several times and saved chip builders from a costly switch to an extreme ultraviolet (EUV) process so far. IBM's discovery could delay the transition for at least one more product generation.
IBM drives chipmaking process beyond current limitations : Read more
IBM drives chipmaking process beyond current limitations : Read more
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