News Intel and ASML achieve 'First Light' milestone with world's most advanced chipmaking tool — High-NA tools' EUV light source and mirrors are functional

[Admin]

ASML and Intel achieve first light on wafer milestone with ASML's Twinscan EXE:5000 lithography system for the first time.

Intel and ASML achieve 'First Light' milestone with world's most advanced chipmaking tool — High-NA tools' EUV light source and mirrors are functional : Read more

 

[bit_user]

High-NA EUV lithography is anticipated to be adopted by leading chipmakers, including Intel, Samsung, and TSMC, within the next few years. Intel has already expressed intentions to utilize the system for its upcoming Intel 14A node-based generation of chips.

Regarding TSMC, I'm reminded of this:

https://www.tomshardware.com/tech-i...opt-high-na-euv-tools-in-2030-or-later-report
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And ASML case for high-NA:

https://www.tomshardware.com/tech-i...igh-na-euv-chipmaking-tools-are-too-expensive
​

 

[thestryker]

The High-NA pricing came up during Ian Cutress' interview with Pat Gelsinger (that bit is at the start though it's a good interview):

View: https://www.youtube.com/watch?v=0PrmrMQ9gJU

 

[NinoPino]

The title way "Intel and ASML achieve..." but what was the role of Intel in such achievement? Pushed the button ? Open the wallet ? Cheered ?

 

[bit_user]

The title way "Intel and ASML achieve..." but what was the role of Intel in such achievement? Pushed the button ? Open the wallet ? Cheered ?

Intel was a development partner for High-NA. In return, ASML granted them an exclusivity period for the technology, IIRC. However, if the concerns about its cost-competitiveness are valid, that might turn out to be a non-issue.