News Japanese researchers mull using particle accelerator for chipmaking — researchers claim EUV-like lithography capabilities

[Admin]

Free-electron laser generated by energy recovery linear accelerator could be used for chipmaking, perhaps, in the long-term future. Perhaps.

Japanese researchers mull using particle accelerator for chipmaking — researchers claim EUV-like lithography capabilities : Read more

 

[Deleted member 2731765]

The electrons pass through an undulator, emitting light that is amplified through a process called self-amplified spontaneous emission (SASE).

No, to put this more clearly, basically the undulators force the electrons which are of course speeding to follow a "sinusoidal" route, and thus this motion causes the electrons to emit light. SASE happens after this.

BTW, spatio-temporal splitting of FEL pulses can help mitigate the coherence and speckle-related obstacle and challenges we might still face. Though, I wouldn't worry much about this yet.

Because we can't ignore FEL's characteristics akin to shorter pulse duration, narrower bandwidth, and of course higher repetition rate.

But last year, the researchers already submitted a journal related to testing done on High-power EUV free-electron laser for future lithography. And actually the good part is that despite the high peak power of FELs, the design of the scanner still ensures that the risk of damage to optics is minimal.

Paper which was published on 19 April 2023:

https://iopscience.iop.org/article/10.35848/1347-4065/acc18c/pdf

 

[TechyIT223]

So it's basically old research tech ?

 

[ivan_vy]

No, to put this more clearly, basically the undulators force the electrons which are of course speeding to follow a "sinusoidal" route, and thus this motion causes the electrons to emit light. SASE happens after this.

BTW, spatio-temporal splitting of FEL pulses can help mitigate the coherence and speckle-related obstacle and challenges we might still face. Though, I wouldn't worry much about this yet.

Because we can't ignore FEL's characteristics akin to shorter pulse duration, narrower bandwidth, and of course higher repetition rate.

But last year, the researchers already submitted a journal related to testing done on High-power EUV free-electron laser for future lithography. And actually the good part is that despite the high peak power of FELs, the design of the scanner still ensures that the risk of damage to optics is minimal.

Paper which was published on 19 April 2023:

https://iopscience.iop.org/article/10.35848/1347-4065/acc18c/pdf

dude, you are awesome and always a delight to read your comments.

 

[TJ Hooker]

No, to put this more clearly, basically the undulators force the electrons which are of course speeding to follow a "sinusoidal" route, and thus this motion causes the electrons to emit light. SASE happens after this.

I don't really see anything incorrect in what you quoted from the article. The self-amplification does occur within the undulator, along with the sinusoidal movement/light emission.

 

[Deleted member 2731765]

As per the original source (spectrum.ieee),

Other EUV Possibilities : It’s too early in the development of EUV free-electron lasers for rapidly expanding chipmakers to pay it much attention.

KEK team is not alone in chasing the technology. A venture-backed startup xLight, in Palo Alto, Calif. is also among those chasing it.

 

[TechyIT223]

dude, you are awesome and always a delight to read your comments.

:⁠-⁠)