News Samsung rep says High-NA EUV is good for logic, but might have cost issues for memory fabrication — Intel, ASML, and others share more bullish views

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scottslayer

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Mark Slezak, the president of JSR USA (a photoresist supplier), suggested that EUV technology could last 20 years. He drew parallels with the extended use of DUV lithography, which lasted much longer than anticipated due to innovations like immersion lithography and multi-patterning. Slezak believes similar advancements could prolong EUV's relevance, with High-NA EUV being a potential example.
I assume everyone at the meeting looked at each other very nervously because those "innovations" for DUV were deperately needed because EUV was heavily delayed.
EUV and High-NA are going to need to stick around because next gen Hyper-NA is reportedly extremely expensive (500 million per machine at least) and companies are getting antsy with the costs.
 

Steve Nord_

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Probing Hydrodynamic Fluctuation-Induced Forces with an Oscillating Robot
Steven W. Tarr, Joseph S. Brunner, Daniel Soto, and Daniel I. Goldman
Phys. Rev. Lett. 132, 084001 – Published 20 February 2024 What was spammy abt. saying running from flash was how this started or calling DUV exposure units dead raccoons!
 
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