News China-based firm delivers its first chipmaking tool that stamps nanoscale chip designs onto wafers — Prinano's nanoimprint lithography tool uses qu...

[Admin]

China's Prinano Technology has shipped its first domestically developed semiconductor-grade step-and-repeat nanoimprint lithography system that offers sub-10 nm single-step patterning for applications like memory, photonics, and advanced packaging.

China-based firm delivers its first chipmaking tool that stamps nanoscale chip designs onto wafers — Prinano's nanoimprint lithography tool uses qu... : Read more

 

[IBM296]

Ehh not bad. But until this system can be used for CPU and GPU manufacturing, it doesn't do much to help China's chip companies.

 

[bit_user]

only if the quartz mold can be manufactured with matching accuracy and defects can be kept low.

This is a key point, isn't it?

Also, talking about line widths, I think I read that Intel's old Fin FET node (maybe even 22 nm?) had just an 8 nm fin pitch. The way they accomplished this was by a chemical process to erode that fin layer. So, I get kind of lost when different pitches and feature sizes are being compared, TBH.