News China-based firm delivers its first chipmaking tool that stamps nanoscale chip designs onto wafers — Prinano's nanoimprint lithography tool uses qu...

[Admin]

China's Prinano Technology has shipped its first domestically developed semiconductor-grade step-and-repeat nanoimprint lithography system that offers sub-10 nm single-step patterning for applications like memory, photonics, and advanced packaging.

China-based firm delivers its first chipmaking tool that stamps nanoscale chip designs onto wafers — Prinano's nanoimprint lithography tool uses qu... : Read more

 

[IBM296]

Ehh not bad. But until this system can be used for CPU and GPU manufacturing, it doesn't do much to help China's chip companies.

 

[bit_user]

only if the quartz mold can be manufactured with matching accuracy and defects can be kept low.

This is a key point, isn't it?

Also, talking about line widths, I think I read that Intel's old Fin FET node (maybe even 22 nm?) had just an 8 nm fin pitch. The way they accomplished this was by a chemical process to erode that fin layer. So, I get kind of lost when different pitches and feature sizes are being compared, TBH.

 

[stoatwblr]

If the machines are cheap enough then using multiples will make up the throughput difference. EUV machines are hideously expensive

Remember, it doesn't have to be perfect. "good enough" is sufficient if it's cheaper and/or faster and/or has lower running costs (which is a significant factor on EUV systems)

Time will tell if this is a viable method at scale but remember that 10nm is more than sufficient for a lot of electronics and too small for reliable ram or nand