G
Guest
Guest
Cambridge (MA) - Researchers from the Massachusetts Institute of Technology (MIT) have found a way to develop 25 nm chip structures with a common lithography process, indicating that chip manufacturers will be able to push out the adoption of an expensive Extreme Ultraviolet (EUV) lithography manufacturing process by another chip generation.
Stretching The Limits Of Lithography: MIT Creates 25 Nm Structures : Read more
Stretching The Limits Of Lithography: MIT Creates 25 Nm Structures : Read more