News Tokyo Electron's new tool can reduce the necessity for EUV double patterning and improve yield

[Admin]

Tokyo Electron unveils the Acrevia tool, which can improve patterning with gas cluster beam technology.

Tokyo Electron's new tool can reduce the necessity for EUV double patterning and improve yield : Read more

 

[edzieba]

Whilst it sounds attractive, how many will really bet on spending a few hundred million dollars on a new machine and adding a new process step (or rather, steps, as it will still need clean and metrology steps added to bracket this new etch step), rather than running wafers through their existing machines as a repeated process step?